Benjamin Oswald

Benjamin Oswald
Associate

2100 L Street, NW

Washington, D.C. 20037

boswald@mofo.com

(202) 887-1562

INDUSTRIES + ISSUES

Artificial Intelligence (AI)

BAR ADMISSIONS

New York

District of Columbia

EDUCATION

Cornell University, B.S.

Cornell University, M.Eng.

Cornell Law School, J.D.

Benjamin is a member of the firm’s Patent Group, specializing in patent prosecution, with a focus on machine learning, imaging systems, and medical devices.

Benjamin’s expertise includes drafting and prosecuting domestic and international patent applications, conducting noninfringement and invalidity studies, and providing strategic counseling. He maintains an active pro bono practice and has helped several Afghan allies receive asylum in the U.S.

Prior to joining Morrison Foerster, Benjamin gained extensive experience as a systems engineer and patent agent in the semiconductor industry. He led a team to design, quantify, and implement a source system for ion implantation of exotic materials in high-volume computer chip manufacturing, significantly increasing chip efficiency, and received an award recognizing outstanding execution. As a patent agent, he conducted patentability and freedom to operate analyses, and made patent filing and renewal recommendations to manage a large IP portfolio.

Benjamin also worked at Cornell University’s particle accelerator where he developed and implemented a cryogenically cooled X-ray monochromator system to enable a high-energy beamline used to study advanced materials in their operating environments.

Benjamin holds a B.S. and M.E. in Mechanical Engineering, as well as a J.D., all from Cornell. He is licensed to practice law in the District of Columbia and New York and is registered to practice before the USPTO.