Intellectual Property Litigation and Technology Transactions
PLI California Center685 Market StreetSan Francisco, CA
Why You Should AttendPLI’s 15th Annual Institute on Intellectual Property Law is a “must attend” program for IP lawyers. In this two-day program you will learn about many of the most important developments in patent, trademark, copyright, and trade secret law. A highlight of the program will be a panel of in-house IP counsel from prominent companies, discussing IP management in difficult economic times and suggesting some best practices for dealing with these problems. Other plenary sessions will treat IP in the new administration, protecting content in new technologies, privacy and data protection, IP issues in standard setting, a trade secret law update, and ethics for the IP lawyer.
This year’s program will also feature four breakout sessions, each with three current topics that will focus respectively on copyrights, licensing, patents, and trademarks. Among the breakout topics will be recent business method patent cases, the ramifications of the Second Circuit’s Cablevision decision, trademark damages and valuation, and recent developments in U.S. licensing law.
What You Will Learn
Who Should AttendGeneral practitioners, intellectual property attorneys, in-house counsel, and others who need a comprehensive update on the major areas of intellectual property law. Join Institute Co-chairs David Bender and Bob Taylor, and a faculty of distinguished intellectual property practitioners from major corporations and law firms in the United States and Europe. Don’t miss this once-a-year opportunity to learn from the best and to network with in-house and outside intellectual property lawyers from around the world. In just two days, you will become up to date on many of the important intellectual property developments, learn best practices in a variety of practice settings, hear best practices to maximize the value of intellectual property assets, and earn ethics credit too!
For more information or to register, please visit: http://www.pli.edu/product/seminar_detail.asp?id=48984&t=wsr6_8lfml
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